Chemical Vapor Deposition (CVD)
Oct 16, 2024| Chemical Vapor Deposition (CVD)
Ntau tshaj li ob lub gaseous los yog kua reactant vapors yog nkag mus rau hauv cov tshuaj tiv thaiv chamber nyob rau hauv lub tshuab nqus tsev kub tej yam kev mob, qhov twg tshuaj tiv thaiv tshwm sim nyob rau hauv lub wafer nto los tsim ib tug tshiab khoom thiab tso rau nws.
Tam sim no, CVD kev ua lag luam occupies lub siab tshaj plaws kev faib ua feem thiab tseem iterating.
Raws li qhov sib txawv cov tshuaj tiv thaiv (siab, precursor), nws muab faib ua atmospheric siab CVD (APCVD), tsis tshua muaj siab CVD (LPCVD), plasma enhanced CVD (PECVD), siab ceev plasma CVD (HDPCVD) thiab atomic txheej deposition (ALD. ).
IKS PVD tuam txhab, kho kom zoo nkauj txheej tshuab, cuab yeej txheej tshuab, DLC txheej tshuab, kho qhov muag txheej tshuab, PVD nqus txheej kab, txoj haujlwm tig-key yog muaj. Hu rau peb tam sim no, E-mail: iks.pvd@foxmail.com