Tsis tshua muaj siab CVD, LPCVD

Tsis tshua muaj siab CVD, LPCVD

Low-pressure chemical vapor deposition (LPCVD) yog CVD cov tshuaj tiv thaiv tsim los txo cov kev khiav hauj lwm siab ntawm cov pa roj thaum lub sij hawm deposition cov tshuaj tiv thaiv nyob rau hauv lub reactor mus txog 133Pa. LPCVD cov cuab yeej nta: LPCVD tsis tshua muaj siab thiab kub kub ib puag ncig txhim kho cov pa diffusion coefficient thiab txoj hauv kev tsis pub dawb hauv cov tshuaj tiv thaiv chamber, thiab txhim kho cov yeeb yaj kiab zoo sib xws, kev tiv thaiv ib puag ncig, thiab zawj npog thiab ua kom muaj peev xwm. Tsis tas li ntawd, nyob rau hauv ib puag ncig uas tsis tshua muaj siab, cov khoom siv roj kis tau nrawm, thiab cov impurities thiab cov tshuaj tiv thaiv los ntawm cov khoom siv hluav taws xob tuaj yeem raug tshem tawm sai sai ntawm thaj chaw tshuaj tiv thaiv los ntawm cov ciam teb txheej, thaum cov tshuaj tiv thaiv roj tuaj yeem ncav cuag sai. substrate nto los ntawm ciam teb txheej rau cov tshuaj tiv thaiv. Yog li ntawd, tus kheej-doping tuaj yeem cuam tshuam tau zoo thiab kev tsim khoom tuaj yeem txhim kho. Tsis tas li ntawd, LPCVD tsis tas yuav muaj cov pa roj carbon monoxide, yog li txo cov pa phem heev. Nws yog dav siv nyob rau hauv kev lag luam semiconductor nrog siab ntxiv tus nqi, raws li nyias zaj duab xis deposition. Txoj kev loj hlob tshiab ntawm cov khoom siv LPCVD: kev ntxhov siab tsawg, ntau txoj haujlwm. Rau ntau cov khoom siv micromachined, xws li silicon nitride thiab polysilicon, kev ntxhov siab yog yam tsis muaj kev zam. Hauv qee cov txheej txheem MEMS precision, cov yeeb yaj kiab tsis tshua muaj kev ntxhov siab yuav tsum tau ua kom ntseeg tau tias cov khoom siv me me deformation. (1) Los ntawm cov qauv tsim tshwj xeeb ntawm cov qauv huab cua thiab kab noj hniav thiab cov qauv txheej txheem sib xws, cov yeeb yaj kiab kev ntxhov siab tuaj yeem tswj tau hauv ntau qhov kev ua tiav, thiab cov teeb meem ntawm deformation, kho qhov muag thiab cov khoom siv kho qhov muag hloov pauv los ntawm lub neej ntawm zaj duab xis kev nyuaj siab. daws. (2) Ua tau raws li cov neeg siv khoom xav tau rau TEOS cov txheej txheem pyrolysis qis thiab cov txheej txheem polysilicon nrog cov nqi sib txawv ntawm cov yeeb yaj kiab, thiab xyuas kom meej qhov sib xws ntawm kev sib sau zaj duab xis thiab qhov warpage degree ntawm silicon wafer. (3) Multi-functional LPCVD cov cuab yeej muaj cov cuab yeej tshwj xeeb piv nrog cov kev cai ib txwm muaj, suav nrog cov txheej txheem ua yeeb yaj kiab zoo sib xws thiab rov ua dua, lub cim pom zoo kom ua kom huv huv thiab yooj yim txij nkawm ntawm cov chav thiab cov cuab yeej siv, kev tswj cov khoom siv qib siab, siab precision kub. teb tswj thiab zoo kub repeatability, ua tiav Hoobkas automation interface, high-ceev cov ntaub ntawv acquisition algorithm, thiab lwm yam. Nyob rau tib lub sij hawm, nws muaj nplua nuj kev lag luam kev thiab ib tug paub tab kev txhawb nqa txheej txheem kom tau raws li cov neeg muas zaub 'xav tau rau high-end LPCVD khoom.

IKS PVD tuam txhab, kho kom zoo nkauj txheej tshuab, cuab yeej txheej tshuab, DLC txheej tshuab, kho qhov muag txheej tshuab, PVD nqus txheej kab, txoj haujlwm tig-key yog muaj. Tiv tauj peb tam sim no, E-mail:iks.pvd@foxmail.com