Plasma enhanced CVD, PECVD

Plasma enhanced CVD, PECVD

PECVD yog cov txheej txheem uas cov pa roj carbon monoxide ionized nyob rau hauv qhov kev txiav txim ntawm plasma los tsim cov pab pawg hauv cov xeev zoo siab. Cov pab pawg nquag no ncav cuag lub substrate nto los ntawm diffusion thiab tom qab ntawd raug tshuaj lom neeg ua kom tiav cov yeeb yaj kiab txoj kev loj hlob. Cov ntsuas kev ua tau zoo ntawm cov cuab yeej PECVD suav nrog kev sib xws ntawm cov yeeb yaj kiab loj hlob, kev cog lus, thiab cov khoom siv muaj peev xwm. Txhawm rau kom ntseeg tau tias cov yeeb yaj kiab loj hlob zoo, ntxiv rau kev ua kom muaj kev ruaj ntseg ntawm cov cuab yeej, nws yog ib qho tsim nyog yuav tsum tau ua kom zoo thiab ua tiav cov txheej txheem txheej txheem thiab ntau yam cuam tshuam rau qhov zoo ntawm cov yeeb yaj kiab. Cov yam ntxwv cuam tshuam rau qhov zoo ntawm cov txheej txheem PECVD feem ntau suav nrog cov hauv qab no: (1) phaj sib nrug thiab cov tshuaj tiv thaiv chamber loj. Flare voltage: Qhov sib nrug yuav tsum tau xaiv kom qhov hluav taws xob hluav taws xob tsawg li tsawg tau kom txo tau cov peev txheej hauv plasma thiab txo qhov kev puas tsuaj rau lub substrate. Phaj sib nrug thiab chamber siab: thaum phaj qhov sib txawv loj, qhov kev puas tsuaj rau lub substrate yog me me, tab sis qhov sib nrug yuav tsum tsis txhob loj dhau, txwv tsis pub nws yuav ua rau cov npoo ntawm cov hluav taws xob ua rau muaj kev puas tsuaj thiab cuam tshuam rau qhov sib xws ntawm kev tso nyiaj. Qhov loj ntawm cov tshuaj tiv thaiv kab noj hniav tuaj yeem ua rau cov khoom tsim tau, tab sis nws kuj cuam tshuam rau qhov sib xws ntawm thickness. (2) Kev ua haujlwm zaus ntawm RF fais fab mov. Rf PECVD feem ntau siv 50kHz-13.56MHz zaus band RF fais fab mov, uas muaj cov zaus siab thiab muaj zog foob pob tawg ntawm ions hauv cov ntshav. Cov zaj duab xis deposited yog ntom, tab sis kev puas tsuaj rau lub substrate kuj tseem loj. Lub uniformity ntawm zaj duab xis tso rau ntawm high zaus yog obviously zoo tshaj qhov uas tsawg zaus. Lub sijhawm no, vim tias qhov hluav taws xob nyob ze ntawm ntug ntawm lub phaj tsis muaj zog thaum lub zaus ntawm RF fais fab mov tsis tshua muaj, nws qhov kev tso tawm ceev yuav qis dua qhov chaw nruab nrab ntawm lub phaj, thaum qhov sib txawv ntawm ntug thiab qhov nruab nrab. cheeb tsam yuav me dua thaum qhov zaus siab. (3) RF zog. Lub zog ntawm xov tooj cua zaus ntau dua, qhov ntau dua lub zog ntawm cov ions, uas yog qhov tsim nyog rau kev txhim kho qhov zoo ntawm cov zaj duab xis deposition. Vim tias qhov nce hauv lub zog yuav txhim kho qhov concentration ntawm cov dawb radicals hauv cov pa roj, qhov kev tso nyiaj tso tawm nce linearly nrog lub zog. Thaum lub hwj chim nce mus rau ib qho twg, cov tshuaj tiv thaiv roj yog kiag li ionized thiab cov dawb radicals ncav cuag saturation, thiab cov deposition nqi yuav ruaj khov. (4) cua siab. Thaum tsim cov plasma, cov roj siab loj dhau lawm, cov tshuaj tiv thaiv roj hauv chav tsev nce, yog li tus nqi nce, tab sis tib lub sijhawm, huab cua siab dhau lawm, qhov nruab nrab ntawm txoj kev dawb yuav txo qis, uas tsis zoo rau kev tso nyiaj. zaj duab xis los npog cov kauj ruam. Cov huab cua tsis tshua muaj siab yuav cuam tshuam rau cov txheej txheem deposition ntawm zaj duab xis, uas ua rau txo qis ntawm qhov ntom ntawm zaj duab xis, thiab yooj yim rau kev tsim cov koob tsis xws luag. Thaum cov huab cua siab dhau lawm, cov tshuaj tiv thaiv polymerization ntawm plasma yog pom tseeb txhim kho, ua rau txo qis ntawm kev loj hlob ntawm lub network thiab nce qhov tsis xws luag. (5) kub substrate. Kev cuam tshuam ntawm substrate kub ntawm qhov zoo ntawm zaj duab xis mas yog nyob rau hauv lub zos lub xeev ceev, electron txav, thiab optical zog ntawm cov zaj duab xis. Qhov nce hauv qhov kub thiab txias ntawm substrate yog qhov tsim nyog rau kev them nyiaj ntawm kev ncua kev kawm ntawm cov yeeb yaj kiab, thiab qhov tsis xws luag ntawm cov yeeb yaj kiab txo qis. Qhov kub ntawm substrate tsis muaj qhov cuam tshuam me ntsis ntawm qhov tso nyiaj, tab sis muaj txiaj ntsig zoo rau qhov zoo ntawm zaj duab xis. Qhov siab dua qhov kub, qhov ntau dua qhov ntom ntawm cov zaj duab xis deposition, qhov kub thiab txias tau txhim kho cov tshuaj tiv thaiv saum npoo thiab txhim kho qhov muaj pes tsawg leeg ntawm zaj duab xis. High-capacity tubular PECVD yog nyob rau hauv kev thov muaj zog. Muaj qhov xav tau loj thiab ceev ceev rau cov khoom siv hluav taws xob siab tubular PECVD hauv kev lag luam silicon cell, thiab lub zog siab tubular PECVD yog tsim los ntawm tus kheej. Nws yuav ua lub luag haujlwm tseem ceeb hauv kev txo cov nqi them nqi ntawm crystalline silicon cell manufacturers thiab tsim kom muaj zog endogenous ntau dua rau kev loj hlob sai ntawm crystalline silicon cell hnub ci. Cov khoom siv ntau lawm tubular PECVD, ib qho khoom siv tuaj yeem ua tau raws li 5 txheej txheem raj, lub peev xwm ntawm ib lub raj tau mus txog 400 daim, yuav luag tsis tas yuav nce lub sijhawm ua haujlwm, tuaj yeem siv rau 156-162 hli silicon wafers, a ib leeg muaj peev xwm ua tau raws li ntau tshaj 110MW ntau lawm kab, zaj duab xis uniformity yog zoo.

IKS PVD tuam txhab, kho kom zoo nkauj txheej tshuab, cuab yeej txheej tshuab, DLC txheej tshuab, kho qhov muag txheej tshuab, PVD nqus txheej kab, txoj haujlwm tig-key yog muaj. Tiv tauj peb tam sim no, E-mail:iks.pvd@foxmail.com