Ceramic MOBILEPHONE Npog Phaj Txheej Txheej Qhia Txheej Txheem

Ceramic MOBILEPHONE npog phaj txheej txheem txheej txheem qhia

Nrog txoj kev loj hlob sai ntawm 5G thev naus laus zis, ceramics yuav dhau los ua cov khoom siv txhawj xeeb tshaj plaws hauv 5G era los ntawm kev tsis muaj teeb liab thaiv thiab cov cuab yeej zoo, thiab kev ua lag luam tau txais kev lag luam yav tom ntej yuav tau dav heev. Kev kho saum npoo ntawm cov khoom lag luam ceramic yuav tsum muaj txheej txheem PVD txheej. Tam sim no, txheej txheem txheej ntawm cov khoom siv ceramic yog feem ntau evaporation thiab sputtering. Logo lossis zaj duab xis xim thiab AF kho yog plated ntawm cov khoom lag luam ceramic. Cia wb mus saib ntawm ob txheej txheem no.

Daim duab ntawm PVD Logo rau ntawm ceramic rov qab lub xov tooj ntawm cov xov tooj tau coj hauv koob thib peb lub rooj muag zaub

nqus tsev e vapor ation txheej

Lub tshuab nqus tsev evaporation zaj duab xis yog ib hom zaj duab xis tsim nyob rau saum npoo ntawm cov txheej dej hauv qab nqus dej . Tshav kub vaporizes cov khoom siv evaporating thiab tso nws rau ntawm txheej txheej txheej los ua ib zaj duab xis.

Daim duab nqus evaporation txheej schematic daim duab

Txheej txheem theem pib ntawm lub tshuab nqus tsev evaporation txheej:

Npaj ua ntej plating → nqus tsev nqus tsev → ion tso khoom tawg ua mov → ci mel ua kom sov mel ua ntej → yaj → kom yaj → coj qhov chaw → membrane kho saum npoo products cov khoom tiav

Daim duab nqus plua plav txheej txheem txheej txheem ntws tawm

Cov yam ntxwv ntawm kev nqus evaporation txheej:

Qhov zoo: cov khoom siv yog yooj yim thiab yooj yim rau kev khiav lag luam, zaj duab xis ua los ntawm cov siab huv, qhov zoo, tuab tuaj yeem tswj tau qhov tseeb ntau dua, zaj duab xis ua kom muaj nuj nqis yog ceev, high efficiency, zaj duab xis loj hlob mechanism yog qhov yooj yim.

Qhov tsis zoo: zaj duab xis ua rau lub substrate adhesion yog me me, cov txheej txheem rov ua dua tsis tau zoo, nws tsis yooj yim kom tau txais cov qauv crystalline ntawm zaj duab xis .

Magnetron sputtering txheej

Magnetron sputtering txheej txheem:

Nyob rau hauv tus txheej txheem ntawm nrawm mus rau lub substrate nyob rau hauv qhov kev txiav txim ntawm hluav taws xob, hluav taws xob sib tsoo nrog argon atoms, ionize ntau ntawm argon ions thiab electrons, thiab tom qab ntawd ya mus rau hauv av. Raws li qhov kev txiav txim ntawm hluav taws xob teb, argon ions nrawm nrawm rau tawg lub hom phiaj, dhau los ua cov hom phiaj atoms, thiab qhov nruab nrab lub hom phiaj (los yog cov lwg me me) tau muab tso rau ntawm lub substrate los tsim zaj duab xis.

LIG. Magnetron sputtering tso

Magnetron sputtering lub ntsiab txheej txheem:

(l) daim nyias nyias tau ntxuav tsuas yog los ntawm chav ntawm isopropyl cawv, thiab tom qab ntawd tsau hauv ethanol thiab acetone, tom qab ntawd ua kom qhuav sai kom tshem cov roj stains ntawm qhov chaw;

(2) lub tshuab nqus tsev, lub tshuab nqus tsev yuav tsum tswj hwm saum 2 × 104Pa kom muaj qhov ntshiab ntawm zaj duab xis;

(3) cua sov. Txhawm rau kom tshem tawm ya raws ntawm cov npoo ntawm cov txheej thiab txhim kho kev nplaum ntawm cov zaj duab xis thiab cov txheej tsiaj, cov txheej txheem yuav tsum ua kom sov. Qhov kub no feem ntau xaiv tau ntawm 150 ℃ mus txog 200 ℃ .

(4) argon qhov siab feem ntau xaiv nyob rau hauv thaj tsam ntawm 0.01 ~ 1Pa kom tau raws li qhov siab ceev ntawm lub siab ci ci;

(5) ntsuas ua ntej. Cov ntsuas phom ua ntej yog tshem cov oxide zaj duab xis nyob rau saum npoo ntawm cov khoom siv phiaj los ntawm ion bombardment, yog li kom tsis txhob cuam tshuam rau qhov zoo ntawm zaj duab xis;

(6) sputtering: nyob rau hauv qhov kev ua ntawm orthogonal magnetic teb thiab hluav taws xob teb, cov ions zoo tsim tom qab lub ionization ntawm argon ntaus lub hom phiaj ntawm kev kub ceev, kom lub hom phiaj uas tsim los ntawm cov sputtering mus txog lub substrate nto thiab tso nyiaj rau hauv zaj duab xis ;

(7) thaum lub sij hawm annealing, lub thermal expansion coefficients ntawm zaj duab xis thiab substrate yog qhov sib txawv, thiab txoj hlua khi tseem me. Thaum annealing, qhov kev sib nrig sib txawv ntawm cov atoms ntawm zaj duab xis thiab substrate tuaj yeem txhim kho qhov adhesion.

Magnetron sputtering cov txheej txheem ntws ua ke

Raws li cov sib txawv ntawm cov khoom sib xws, cov hlau nplaum sib dhos tuaj yeem muab faib ua dc thiab rf. Lub ntsiab sib txawv ntawm ob cov lus dag hauv qhov sib txawv ntawm cov pa paug. Rf magnetron sputtering USES rf paug tawm, thaum cov khoom lag luam ceramic siv rf magnetron sputtering.

Magnetron sputtering txheej nta:

Cov txiaj ntsig zoo: kev coj dawb huv, ntom ntom, cov npoo tuab tuaj yeem tswj tau, cov txheej txheem rov ua dua tau zoo dua, muaj zog adhesion.

Qhov tsis zoo: cov cuab yeej siv nyuaj, qhov phiaj siv tsawg.

IKS PVD ， evaporation thiab magnetron sputtering PVD txheej tshuab, rau kev lag luam xov tooj txawb.Thov txuas nrog peb tam sim no, iks.pvd @ foxmail.com