Yam ntxwv ntawm PVD Nanocoatings
May 22, 2019| Cov yam ntxwv ntawm PVD nanocoatings
Muaj peb txoj hauv kev rau lub cev ntim cov dej ntim ntawm nano-coatings: lub tshuab nqus tsev, lub tshuab nqus tsev, thiab lub raj nqus dej. Cov kua dej qhuav yog vaporize cov khoom siv rau cov khoom siv (atoms lossis ions) los ntawm cov hluav taws xob hluav taws xob, cua sov, thiab tom qab ntawd mam li tso rau saum npoo ntawm cov haujlwm workpiece los tsim ib txheej. Qhov txheej muaj ntau qhov hws, uas muaj ib qho kev nplaum nrog lub substrate. Sputtering plating yuav siv cov workpiece ua tus anode thiab lub hom phiaj raws li cathode. Cov argon ion generated los ntawm argon ionization yog siv los tshuab tawm lub phiaj atoms thiab tso rau hauv cov haujlwm workpiece. Cov txheej txheem muaj tsawg dua qhov pores thiab zoo ua ke nrog cov substrate. Ion plating yog ua kom cov khoom siv rau hauv tsev los ntawm evaporation, sputtering los yog tshuaj txoj kev thiab yuav raug ionized los ntawm cov ntshav ntawm ib ncig ntawm lub substrate. Nyob rau hauv qhov kev txiav txim ntawm lub teb hluav taws xob, qhov txheej txheem yog tsim los ntawm ya mus rau lub substrate nrog ntau lub zog kinetic. Qhov txheej yog xim thiab ntom nti, nrog qhov tsis muaj qhov pores, thiab ua ke zoo nrog cov substrate.
Titanium oxide nanofilms tau npaj los ntawm dc magnetron sputtering. Lub tshuab chais txoj kab npab nchuav pumped rau 1.3 10-4pa, thiab tom qab ntawd puv nrog Ar, O2 thiab CF4, qhov siab tag nrho yog 1.3pa (cov tshuaj txhaj tshuaj thaum tswj tau). Lub thickness ntawm zaj duab xis yog los ntawm tsis tu ncua qhov tshuab hluav taws xob (700 v) los hloov nws txoj kev tswj tus mob sputtering, sputtering lub sijhawm hauv paus phaj kub tswj hauv 100 ~ 400 ℃ . Cov yam ntxwv ntawm Electrochromic tau pom nyob rau hauv LiC1O4 thiab propylene carbonate. Txawm li cas los xij, zaj duab xis saum npoo yog cuam tshuam los ntawm cov pa roj thiab cov khoom siv, thiab qhov kev ua yeeb yam ntawm cov yeeb yaj kiab yog cuam tshuam los ntawm lub xeev plasma, thiab qhov mob uas tsis yooj yim yuav tsis yooj yim tswj hwm, uas yog qhov tseem ceeb tshaj plaws.
Yuav kom ntxiv txhim kho qhov zoo ntawm nano-txheej, ntau PVD yees tau tsim thiab muab los ntawm kev sib txuam ntawm ntau yam yees siv. Ntau hom magnetron pluttering techniques tau raug tsim los ntawm kev qhia txog magnetic teb rau hauv cov txheej txheem tshuab uas yog cov khoom fais fab. Yuav kom ntxiv dag zog rau cov yeeb tshuaj ntawm cov yeeb yaj kiab, cov roj reactive yog nkag tau rau hauv cov txheej txheem ntawm evaporation, sputtering thiab ion plating, yog li cov cuab yeej evaporation tshuab, reactive sputtering tshuab thiab reactive ion plating technology emerged. Tsis tas li ntawd, muaj xuab zeb (pulse laser deposition) (PLD), magnetron sputtering (MSPLD), ionizedmagnetron sputtering (ionizedmagnetron sputtering), molecular beam epitaxy (MBE), kev loj hlob tsiv thiab lwm cov tshuab tshiab membrane.
Nws tuaj yeem pom tau hais tias nrog kev paub txog science thiab technology, qhov ciam teb ntawm CVD thiab PVD tsis meej, thiab ob daim ntawv tso cai rau ib leeg, yog li ua ob lub txheej txheem yees zoo dua qub.
IKS PVD, zoo nkauj txheej tshuab, cuab yeej txheej tshuab, hu rau: iks.pvd@foxmail.com
