Kev cuam tshuam ntawm Magnetron Sputtering Process Parameters: Deposition Temperature

Kev cuam tshuam ntawm magnetron sputtering txheej txheem tsis: deposition kub

Qhov kub ntawm qhov tso tawm kuj tseem cuam tshuam rau cov khoom siv kho tshuab ntawm (Cr, Ti, Al) N quaternary txheej. Lin Jing et al. saws DC magnetron sputtering thiab arc ion plating composite deposition txheej txheem los npaj (Cr, Ti, Al) N quaternary txheej ntawm 300 degree thiab 400 degree feem [62]. Cov txiaj ntsig kev sim qhia tau hais tias (Cr, Ti, Al) N txheej txheej npaj ntawm 400 degree pom cov khoom zoo dua qub thiab hnav tsis kam dua li cov uas tau npaj ntawm 300 degree. Nrog rau qhov kub ntawm deposition, lub atomic diffusion muaj peev xwm yog kho kom zoo, lub txheej yog denser, thiab cov nitride cov tshuaj tiv thaiv yog ntau txaus, yog li ntawd lub hardness ntawm (Cr, Ti, Al) N txheej yog loj heev. Cov txiaj ntsig kev sim kuj qhia tau hais tias nrog qhov nce ntawm qhov kub thiab txias, qhov kev sib txhuam coefficient thiab hnav tus nqi ntawm cov txheej yog txo, thiab txiav lub neej ntawm cov cuab yeej txheej yog nce. Qhov no yog vim lub hardness ntawm txheej nce nrog qhov nce ntawm deposition kub. Raws li Archard txoj kev xav, qhov kev sib txhuam ntawm cov txheej yog inversely proportional rau hardness, yog li qhov kev sib txhuam ntawm cov txheej yog txo. Tsis tas li ntawd, thaum lub deposition kub yog siab, lub txheej muaj zog tiv thaiv elastic deformation thiab yas deformation, thiab zoo dua tsis kam mus rau kev puas tsuaj, yog li nws tsis yooj yim rau tawg thaum lub sij hawm kev sib txhuam, uas yog conducive rau txo tus nqi ntawm cov khoom. txheej. Cov txheej npaj ntawm 400 degree muaj zog dua thiab toughness, thiab qis dua qhov sib txhuam, uas yog qhov zoo rau kev ncua lub neej ntawm cov cuab yeej.

IKS PVD tuam txhab, kho kom zoo nkauj txheej tshuab, cuab yeej txheej tshuab, DLC txheej tshuab, kho qhov muag txheej tshuab, PVD nqus txheej kab, txoj haujlwm tig-key yog muaj. Hu rau peb tam sim no, E-mail: iks.pvd@foxmail.com